Magnetron sputtering, Thin film deposition, SiMTra
Resumo
The deposition of titanium and gadolinium films by magnetron sputtering was simulated by using software SiMTra. The main goal is to analyze the average energy of deposited atoms as a function of argon pressure at different anode geometries. Two different anode configurations were used: a grid inserted between the target and the substrate, in the so-called grid-assisted magnetron sputtering, and a disk with different apertures. In the case of grid anode, simulations were also performed with a shutter in front of the substrate. The presence of the grid increases the average energy of atoms arriving at the substrate for pressures in the range between 1.0 and 8.0 Pa. The disk anode also changes the average energy, but such effect depends on the size of aperture.
