Deposition inside hollow substrates of zirconia in late Ar-O2-H2 post-discharges is considered. lnner surface of cylindrical substrates of about two tens centimeters long could be coated by this process over their whole length with a thin film of zirconia from 573 K upwards. A complete modeling was required to control the process. Resolution of the conservation equations of continuity, momentum and energy was carried out. lndeed, by this mean, the thickness homogeneity of layers were improved to lead to almost constant or weakly decreasing deposition rates along the substrate.
