Influence of the plasma nitriding conditions on the chemical and morphological characteristics of TiN coatings deposited on silicon

Authors

  • João Valério de Souza Neto Instituto Federal de Educação, Ciência e Tecnologia do Piauí
  • Ricardo Silva de Freitas Instituto Federal de Educação, Ciência e Tecnologia do Piauí
  • Bartolomeu Cruz Viana Neto Federal University of Piauí image/svg+xml
  • Francisco Eroni Paz dos Santos Federal University of Piauí image/svg+xml
  • Pedro Augusto de Paula Nascente Federal University of São Carlos image/svg+xml
  • Denise Aparecida Tallarico Federal University of São Carlos image/svg+xml
  • Valmor Roberto Mastelaro University of São Paulo image/svg+xml
  • Rômulo Ribeiro Magalhães de Souza Federal University of Piauí image/svg+xml

DOI:

https://doi.org/10.17563/rbav.v37i2.1083

Keywords:

Titanium nitride, Cathodic cage plasma deposition, Coatings

Abstract

Titanium nitride (TiN) coatings were grown on silicon substrates by cathodic cage plasma deposition (CCPD). TiN coatings present interesting properties, such as high hardness, chemical and thermal stabilities, good thermal and electrical conductivities, and corrosion resistance, making them suitable for several technologically important applications. The influence of parameters such as plasma nitriding atmosphere, temperature, and time on the chemical and morphological characteristics of the deposited coatings was investigated by means of Raman spectroscopy, scanning electron microscopy, energy dispersive spectroscopy, and X-ray photoelectron spectroscopy. The results obtained by these characterization techniques revealed that the TiN coatings produced by CCPD presented high quality.

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Author Biographies

  • Bartolomeu Cruz Viana Neto, Federal University of Piauí
    Professor Associado, Centro de Ciências da Natureza, Departamento de Física.
  • Francisco Eroni Paz dos Santos, Federal University of Piauí
    Professor Adjunto, Centro de Ciências da Natureza, Departamento de Física.
  • Pedro Augusto de Paula Nascente, Federal University of São Carlos
    Professor Titular, Departamento de Engenharia de Materiais. Área de pesquisa: Superfícies, Interfaces e Filmes Finos.
  • Denise Aparecida Tallarico, Federal University of São Carlos
    Professora Adjunta, Campus de Sorocaba, Centro de Ciências em Gestão e Tecnologia, Departamento de Engenharia de Produção.
  • Valmor Roberto Mastelaro, University of São Paulo
    Professor Associado MS 5, Instituto de Física de São Carlos, Departamento de Física e Ciências dos Materiais.
  • Rômulo Ribeiro Magalhães de Souza, Federal University of Piauí
    Professor, Programa de Pós-Graduação em Ciência dos Materiais.

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Published

2018-07-21

Issue

Vol. 37 No. 2 (2018)

Section

Ciência e Tecnologia de Plasmas