The measurement of thin films’ optical constants and their thickness involve, in general, the optical path, nd. The result obtained is a product of these two parameters, the thickness d and the refractive index n, making the independent evaluation of the each parameter complex. This work presents the results of four different techniques, Channel Spectra, Ellipsometry and Small Angle Diffractometry, to measure the thickness and the optical constants of thin films of Ta2O5 and ZrO2, besides the “in situ” quartz crystal oscillator used to control the deposition process. A good agreement was found among these results. The thin films were deposited by e-beam gun and the films’ thickness were around 350 nm for BK-7 and quartz substrates, and 70 nm for Si substrates.
