The results of diamond growth on a Ti film-304 stainless steel (304 SS) system are presented and discussed. The 304 SS (a specific steel) surface was previously modified by titanium adherent film to make a barrier against carbon diffusion. Diamond film were deposited on titanium film-304 SS system, at a temperature about 550 °C, using Chemical Vapor Deposition from CH4 / H2 mixture in percentages of 2.5 wt% and 97.5 wt% respectively. This diamond film was characterized by SEM, Raman spectroscopy and X-ray diffraction. The cross sections of these CVD diamond film-Ti film-304 SS samples were analyzed by EDS. The results indicated the nucleation and growth of CVD diamond polycrystalline on Ti film-304 SS system with good quality but poor adherence.
Biografia do Autor
Rogério de Almeida Vieira, UNIVILLE
Departamento de Mestrado em Engenharia de Processos - Área de Pós-Graduação
