We report in this paper the main steps in the production of masks, reticle and master plates by using electron-beam lithographic system, ZBA-21 (JENOPTiK). We here report a routine to be followed by researchers when specifying masks or reticles to be made by e-beam lithography. The correct layout definition and subsequent conversion to e-beam system are determined by several factors, among them electron-resist type, pre and post processing bakes, development parameters. We adopted the AZPF514FL as the principal resist for our processing line. This choice is based on the property of that formulation which is know as chemically amplified, CAR, with a great advantage over other resists in the sensitivity parameter. We present the main experimental procedures in the laboratory to obtain the chrome reticles and masks plate for electronic devices and IC manufacture.
