NUMERICAL SIMULATION OF THE FLUID FLOW IN THE MULTI-HOT-FILAMENT CHEMICAL VAPOR DEPOSITION - MHFCVD

Autores

  • Divani Barbosa Gavinier
  • Hélcio Francisco Villa Nova
  • Mauricio Ribeiro Baldan

DOI:

https://doi.org/10.17563/rbav.v26i3.36

Resumo

Multi hot-filament chemical vapor deposition (MHFCVD) is a common method employed for diamond deposition. In this method a mixture of hydrocarbon in excess of hydrogen is thermally activated by a hot filament. Due to the filament-substrate proximity, large temperature variation across the substrate is possible. In this work the role of fluid flow and heat transfer in the MHFCVD was investigated. The equations of conservation of mass, momentum, and energy were solved numerically to calculate the temperature distribution and fluid flow fields, using the commercial software CFX. The calculation takes into account two different sets up configurations. The influence of heat transfer and convective transport is reported.

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Publicado

2008-01-15

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