In this paper, a new evaporation system is presented, allowing the injection of viscous and/or sensitive precursors in-side a CVD reactor chamber. The setup was originally developed for Titanium(IV) Isopropoxide (TTIP), which is known for its sensitivity toward air moisture, its high viscosity, and its ability to precipitate easily in undesirable conditions. This setup is adapted for the injection of all types of liquid and viscous precursors, and for the evaporation of solid precursors with the help of an adequate accessory. The major benefit of this system is a precise control and a high stability of evaporation temperature, and a homogeneous temperature gradient from the point of evaporation to the junction with reactor. This virtually eliminates all risks of re-condensation or deposition inside of the evaporator. The construction and the functioning of this device is explained in details, and compared to the usual evaporation methods.
