The basic principles of plasma polymerization processes are examined along with the reactor architeture's. Enphasis is given to the chemistry of the discharge and to active species and deposition precursors with the aim of correlating film compositions with discharge internal parameters. The processes for the deposition of films of fluoropolymers, metal containing polymers, SiO2-likes and silicone-likes, and amorphous carbon are examined as case studies.
