GROWTH PARAMETERS OPTIMIZATION TO SYNTHESIZE CVD DIAMOND THROUGH GRAPHITE ETCHING

Autores

  • Maurício Ribeiro Baldan Instituto Nacional de Pesquisas Espaciais
  • William de Melo Silva
  • Adriana Faria Azevedo
  • Neidenêi Gomes Ferreira

DOI:

https://doi.org/10.17563/rbav.v28i3-4.688

Palavras-chave:

graphite etching, CVD diamond, Raman spectroscopy, hydrocarbon formation

Resumo

Diamond films were deposited from graphite etching as a carbon source with atomic hydrogen instead of using con-ventional hydrocarbon in the feed gas. A graphite plate was used as sample support in a hot filament chemical vapour deposition reactor. Graphite temperature, gas flow rate as well as the pressure inside the reactor presented a strong influence on the diamond growth rate, morphology and quality. Scanning electron microscopy images showed that the films grown at 600 and 700 ºC depicted similar morphologies while the film grain size decreased as a function of the pressure and the gas flux increases. Raman analyses confirmed good diamond quality in the whole ranges of such parameters variation and was also used to analyse the sp2/sp3 ratios of the three produced sample sets. For deposition time of 4 h the process efficiency was evaluated from the ratio between the diamond mass after deposition and the mass lost by the graphite target. In the range of the experimental parameters studied the highest efficiency value was 0.43 obtained at 700 ºC, for a pressure of 30 Torr and flux of 100 sccm, respectively.

Biografia do Autor

Maurício Ribeiro Baldan, Instituto Nacional de Pesquisas Espaciais

Laboratório Associados de Sensores

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Publicado

2010-09-26

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